PECVD Graphite – Industrial-Grade Description

PECVD graphite is a high-performance graphite component specifically engineered for plasma-enhanced chemical vapor deposition (PECVD) processes. Manufactured from ultra-high purity, fine-grained graphite, it provides excellent thermal stability, uniform conductivity, and low impurity levels critical for contamination-sensitive environments. Its optimized microstructure ensures consistent plasma interaction and uniform film deposition across substrates. With low thermal expansion and strong resistance to thermal shock, PECVD graphite maintains dimensional integrity under rapid temperature cycling. Optional surface coatings further enhance oxidation resistance and lifespan. Widely used in semiconductor manufacturing and thin-film deposition systems, it ensures precise process control, repeatability, and long-term operational reliability.

Grade	Bulk Density (g/cm³)	Electric Resistivity (μΩ·m)	Compressive Strength (MPa)	Flexural Strength (MPa)	Shore Hardness	Ash Content (ppm)	Purified Ash: Graphitization (ppm)	Purified Ash: Product (ppm)	Coeff. of Thermal Expansion (*10⁻⁶/°C)	Thermal Conductivity W/(m·K)	Young's Modulus (GPa)	Applications
CDI-1A	1.85	10-13	90	45	60	300	50	5	5.5	133	11.5	Semiconductor, Heat zone in PV Industry, Ceramic Sintering, Vacuum furnace
CDI-1B	1.8	10-13	86	40	55	300	50	5	5.4	121	10	Semiconductor, Heat zone in PV Industry, Ceramic Sintering, Vacuum furnace
CDI-1C	1.82	11-15	100	48	58	300	50	5	5.6	120	10.6	Semiconductor, Heat zone in PV Industry, Ceramic Sintering, Vacuum furnace
CDI-1D	1.75	12-16	80	40	58	300	50	5	5.8	108	10	Semiconductor, Heat zone in PV Industry, Ceramic Sintering, Vacuum furnace

PECVD Graphite Fittings Isostatic Graphite Material Solid Block

Isostatic Graphite

Graphite heaters

PECVD Graphite